Title

Effect of acid etching and sandblasting on the osseointegration potential of implants

Authors

Jyotsna Shukla, Neeraj Sharma*, Kritika Chitlangia, Sadaf Ansari, Divya Patel & Shahin Hamid

Affiliation

Department of Prosthodontics Crown and Bridge and Implantology, Modern Dental College & Research centre, Indore, Madhya Pradesh, India; *Corresponding author

Email

Jyotsna Shukla - E - mail: drjmishra79@gmail.com
Neeraj Sharma - E - mail: drneeraj22@gmail.com

Kritika chitlangia - E - mail: krichitlangia6@gmail.com
Sadaf Ansari - E - mail: ansarisadaf53@gmail.com
Divya Patel - E - mail: dpdivyapatel20@gmail.com
Shahin Hamid - E - mail: shahin.bharawala@gmail.com

Article Type

Research Article

Date

Received April 1, 2025; Revised April 30, 2025; Accepted April 30, 2025, Published April 30, 2025

Abstract

Dental implant surface enhancement techniques such as acid etching and sandblasting which strengthen osseointegration while improving corrosion resistance. Therefore, it is of interest to investigate the effects of these treatments on zirconia along with titanium implants as part of their comparison. Osteoblast adhesion alongside excellent corrosion resistance were found to be superior in acid-treated zirconia resulting in an Rp value of 5.2 kΩ·cm² which was better than titanium. The adherence of cells improved through sandblasting titanium yet zirconia maintained its superior performance in all aspects. Thus, combination of acid etching and sandblasting on zirconia implants results in excellent materials functionality for implantology applications.

Keywords

Dental implants, zirconia, titanium, osseointegration, acid etching, sandblasting, corrosion resistance

Citation

Shukla et al. Bioinformation 21(4): 862-865 (2025)

Edited by

Hiroj Bagde MDS, (PhD), PGDCR, PGDHHM, PGDL, PGDM

ISSN

0973-2063

Publisher

Biomedical Informatics

License

This is an Open Access article which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited. This is distributed under the terms of the Creative Commons Attribution License.